Zirconium oxide ZrO₂ |Hafnium Oxide HfO₂ 99.9%

Sharaxaada

Zirconium oxide ZrO₂, ama Zirconium Dioxide, oo aan si dhab ah loogu milmi karin biyaha, iyo in yar oo ku milma HCl iyo HNO₃, barta dhalaalka 2700°C, cufnaanta 5.85g/cm³, waa crystal aan ur lahayn oo leh dhibic dhalaalaysa sare, iska caabin sare, index refractive sare iyo guryaha isku xidhka ballaarinta kulaylka hoose, taas oo muhiim u ah qalabka u adkaysta heerkulka sare, alaabta dahaaran dhoobada, muraayad qorraxdu dhoobada iyo alaabta ceeriin ee dhagaxyada macmal ah.ZrO₂waa badeecada guud oo ay tahay in lagu hayo meel qabow, engegan oo hawo fiican leh, weelka si adag u xidh kana fogow alkali xooggan.Zirconium oxide ZrO₂waxaa caadi ahaan loo isticmaalaa samaynta biraha zirconium iyo xeryahooda zirconium, dhoobada soo noqnoqda sare, alaabta abrasive, pigments dhoobada, alaabta refractory iyo muraayad indhaha.

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Zirconium oxide ama Zirconium Dioxide ZrO₂oo nadiif ah ZrO₂+HfO₂≥ 99.9% iyo Hafnium Oxide HfO₂oo nadiif ah HfO₂+ZrO₂≥99.9% at Western Minmetals (SC) Corporation waxaa lagu geyn karaa cabbirka 60-150mesh budada, 25kg oo bac ah oo leh durbaan kartoonada ka baxsan, ama sida qeexid loo habeeyey.

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ZrO₂& HfO₂

Zirconium oxide ama Zirconium Dioxide ZrO₂ oo nadiif ah ZrO₂+HfO₂≥ 99.9% iyo Hafnium Oxide HfO₂oo nadiif ah HfO₂+ZrO₂≥99.9% at Western Minmetals (SC) Corporation waxaa lagu geyn karaa cabbirka 60-150mesh budada, 25kg oo bac ah oo leh durbaan kartoonada ka baxsan, ama sida qeexid loo habeeyey.

Walxaha	HfO₂	ZrO₂
Muuqashada	Budada Cad	Budada Cad
Miisaanka Molecular	210.49	123.22
Cufnaanta	9.68 g/cm³	5.85 g/cm³
Meesha dhalaalaysa	2758C	2700 °C
CAS Maya.	12055-23-1	1314-23-4

Maya	Shayga			Tilmaamaha Heerka
1	daahirnimo			Nijaasnimo (PCT Max kasta)	Cabbirka
2	ZrO2	ZrO₂+HfO₂≥	99.9%	Si 0.01, Fe 0.001, Ti/Na 0.002, U/T 0.005	60-150 mesh
3	HfO2	HfO₂+ZrO₂≥	99.9%	Fe/Si 0.002, Mg/Pb/Mo 0.001, Ca/Al/Ni 0.003, Ti 0.007, Cr 0.005	100 mesh
4	Baakad			25kgs oo ku jira bac balaastiig ah oo leh durbaan kartoonada dibadda ah

Hafnium Oxide HfO₂, ama Hafnium Dioxide, isku dhafka hafnium, HfO₂+ZrO₂≥99.9%, barta dhalaalka 2758°C, cufnaanta 9.68g/cm³, waa mid aan lagu milmi karin biyaha, HCl iyo HNO₃, laakiin ku milma H₂SO₄iyo HF.Hafnium oxide HfO₂waa walxo dhoobo ah oo leh faraq ballaadhan oo ballaadhan iyo joogto ah dielectric sare.Hafnium Oxide HfO₂waxay u badan tahay in la beddelo silica insulator-ka iridda ee birta oxide semiconductor field saamaynta si loo xalliyo dhibaatada xaddidaadda cabbirka ee horumarinta qaab dhismeedka dhaqanka SiO₂/Si ee MOSFET, sidaa darteed waa wax horumarsan oo loo isticmaalo beerta microelectronic.Waxa kale oo si weyn loogu isticmaalaa samaynta birta hafnium, xeryahooda hafnium, walxaha refractory, walxaha daahan ka-hortagga shucaaca, iyo kicinta.